| 摘要 |
In a chemical vapor deposition process wherein a plurality of refractory metals is deposited on the surface of a substrate, the usual columnar grain structure of the deposited metals inherent in chemical vapor deposited coatings is rearranged to form an alloy of such metals having a strong, equiaxed grain structure, by depositing the metals in extremely thin layers wherein all adjacent layers are predominately of different metals, and then heattreating the resultant coating. As a result, diffusion of the metals through substantially all adjacent layers, and rearrangement of the grain structure occurs.
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