Electron microscope which prevents undesired X-ray exposure

摘要

An exposed two-dimensional sensor and an exposed two-dimensional sensor in the camera compartment of an electron microscope are shielded against X-rays by respective covers. When a two-dimensional sensor is outside the protective covers during recording, the electron beam from the electron gun of the electron microscope is deflected and blocked by the diaphragm, thereby preventing generation of X-rays due to scattered electrons in the camera compartment. Such an arrangement makes a mechanical shutter unnecessary so that it is possible to prevent exposure of the two-dimentional sensors due to X-rays generated at the shutter and exposure of the two-dimensional sensors due to X-rays generated by scattered electrons in the camera compartment.