| 摘要 |
PURPOSE: To improve the reliability of X-ray lithography and the preciseness of a pattern by forming a stress buffering member on the transmissive substrate of a mask so as to bury an X-ray absorbing layer. CONSTITUTION: A stress-buffering member 25 is formed on a transmissive substrate 22, so as to bury an X-ray absorbing layer 23. In this case the member 25, the external distorting phenomenon of a mask caused by thermal expansion is removed because horizontal internal stresses F1 , F2 , and F3 exist in each part of the mask, and vertical stresses offset each other and become zero. In addition, the X-ray absorbing layer 23 having a stripe-like mask pattern can be protected from damages, etc., and the adjustment and accuracy of the line width of the pattern can be improved. Therefore, the reliability of X-ray lithography can be improved, and moreover the preciseness of the mask pattern can be improved by preventing the pattern from being damaged. |
