| 摘要 |
PURPOSE:To obtain a resin composition for covering able to be processed at low temperature, giving covering layer having excellent weatherability and resistance to chemicals and readily performable of post-processing of covering layer comprising vinylidene fluoride-based resin, polyparabanic acid resin or polyether sulfone. CONSTITUTION:The aimed composition is composed of (A) 30-90 pts.wt. vinylidene fluoride-based resin having preferably 50000-300000 number-average molecular weight, preferably homopolymer of vinylidene fluoride, or copolymer of >=75wt.% vinylidene fluoride and other ethylenic unsaturated compound (e.g. styrene or vinyl chloride) and (B) 10-70 pts.wt., preferably 20-50 pts.wt. polyparabanic acid resin having preferably 10000-200000 number-average molecular weight and/or polyether sulfone having 50000-150000 number-average molecular weight. The component A is previously dispersed or dissolved in a solvent and mixed with the component B dissolved or dispersed in a solvent to afford the aimed composition. |
