TRANSPARENT FABRICATION MASKS UTILIZING MASKING MATERIAL SELECTED FROM THE GROUP CONSISTING OF SPINELS, PEROVSKITES, GARNETS, FLUORIDES AND OXY-FLUORIDES

摘要

A mask for the manufacture of semiconductor and other very small components. The mask is comprised of patterns of multi-component oxides and fluorides, such as spinels, perovskites, and garnets. In general, the materials are harder than the components being manufactured and are opaque to the wavelength used in photoresist techniques, while being transparent to the visible wavelengths. Materials with an energy gap between approximately 2.8 eV and 5 eV satisfy these optical properties, a particular example being GaFeO3. These masks are not damaged by surface defects on the components and can be visually aligned.