| 摘要 |
PURPOSE:To improve measuring accuracy by setting a slit width so that the incident angle of all X rays passing a slit is located within a total reflecting critical angles corresponding to the energy of desired monochrome X rays and higher harmonic X rays. CONSTITUTION:Incident X rays 4 are generated in an X-ray source 1 and input ted into a curved type spectral crystal 5 through slits 2 and 3. The X rays is diffracted in the crystal 5 and transformed into diffracted X rays 6. The X rays 6 are projected on a total reflecting mirror 9 through a slit 7, reflected by the total reflecting mirror 9 and transformed into a reflected X rays 10. The X rays are projected on a sample 12 through a slit 11. Thus absorption spectrum and the like are detected. At this time, an angle phi formed by the total reflecting mirror 9 and a reference spectral plane 14 is set at the central value of a total reflecting critical angle phic corresponding to the maximum value Emax of energy E of basic X rays and a total reflection critical angle phic corresponding to the minimum value Emin of energy nE of X rays higher harmonic X rays. In this way, the higher harmonic waves are always removed in the region of the desired X-ray energy, and the measuring accuracy can be improved. |
