发明名称 CHEMICAL RAY SENSITIVE POLYMER COMPOSITION
摘要 PURPOSE:To obviate the generation of a film roughening without lowering a residual film rate by consisting the above compsn. of a specific polymer, a compd. contg. a quaternarized salt, an arom. azide compd. and/or arom. sulfonazide compd., and N-allyl glycine compd. CONSTITUTION:This compsn. consists of the polymer essentially consisting of the structural unit expressed by formula I, the compd. contg. the unsatd. bond which can be dimerized or polymerized by chemical rays and an amino group or the quaternarized salt thereof, the arom. azide compd. and/or arom. sulfonazide compd. and the N-allyl glycine compd. In the formula I, R1 denotes a tervalent or quadrivalent org. group having at least>=2 carbon atoms; R2 denotes a bivalent org. group having at least>=2 carbon atoms; R3 denotes hydrogen or the paired ion of an alkaline metal; n denotes 1 or 2. The film thinning and film roughening at the time of a (g) ray stepper exposing are lessened in this way.
申请公布号 JPH02294649(A) 申请公布日期 1990.12.05
申请号 JP19890116606 申请日期 1989.05.09
申请人 TORAY IND INC 发明人 TOMIKAWA MASAO;EGUCHI MASUICHI;KUSANO KAZUTAKA
分类号 G03F7/012;C08K5/17;C08K5/28;C08L79/08;H01L21/027;H01L21/30 主分类号 G03F7/012
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