NEGATIVE TYPE PHOTORESIST AND USE THEREOF

摘要

PURPOSE: To impart durability against plasma containing oxygen by preparing a resist from a polymer material obtd. by the interaction between an organosilicon compd. and an epoxy novolac polymer, and a radiation-sensitive onium salt. CONSTITUTION: The resin contains a polymer material obtd. by the interaction between an organosilicon compd. and an epoxy novolac polymer, and a radiation-sensitive onium salt. This onium salt is incorporated by an amt. required to increase the photosensitivity of the compsn. for electron beams, X-rays, ion beams and far UV rays. The polymer material is obtd. by the interaction between an organosilicon compd. and an epoxy novolac. Thereby, the obtd. resist is durable against reactive ion etching in oxygen plasma and an image of high resolution can be obtd.