| 摘要 |
A process for producing a released film made of at least two layers (14,16), one or more of which (16) has been formed by a vapour deposition technique. The process involves anodizing a metal substrate (10,12) comprising a valve metal or valve metal alloy (12) to form an anodic oxide layer (14) on the substrate, the anodization being carried out in the presence of an adhesion-reducing agent (e. g. fluoride) which makes the anodic layer (14) detachable from the valve metal (12), coating the anodic layer (14) with one or more layers of desired materials (16) by a vapour deposition technique (e. g. sputtering or vacuum evaporation, etc. ) to form a film of desired structure (14,16) which is releasable from the metal substrate (10,12), and then detaching the releasable film from the metal substrate. The film can, if desired, be transferred to another substrate (18) by attaching the other substrate to the releasable film (14,16) before the releasable film is detached from the metal substrate. The process makes it possible to provide free-standing vapour deposited films or heat-sensitive (or other) substrates coated with such films. |
