发明名称 MEASURING METHOD FOR SEMICONDUCTOR DEVICE
摘要 PURPOSE:To make it possible to conduct a measurement equal to that after package sealing by a method wherein the surface of a semiconductor device is coated with a dielectric film having a specific dielectric constant. CONSTITUTION:When the photoresist layer 20, which is used to form an aperture part 22 on an insulating layer 16 and a passivation layer 18, is left on a semiconductor substrate 10 in the state as it is, the surface of the semiconductor integrated device is coated with a dielectric film having the dielectric constant of 1 or higher. As a result semiconductor chip is closely resembled to the capacitance between conductive leads in the state after the semiconductor chip is subjected to package-sealing, and an electric measurement equal to the state after package-sealed can be conducted in the substrate state.
申请公布号 JPH02290039(A) 申请公布日期 1990.11.29
申请号 JP19890160191 申请日期 1989.06.21
申请人 NEC CORP 发明人 KOKUGI SHINICHI;OZAWA MASAHIDE
分类号 G01R31/26;G01R31/28;G01R31/316;H01L21/66;H01L21/822;H01L27/04 主分类号 G01R31/26
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