发明名称 RADIATION-CURABLE MIXTURE,AND RADIATION-SENSITIVE RECORDING MATERIAL PRODUCED THEREFROM FOR HIGH-ENERGY RADIATION
摘要 A radiation-curable mixture is proposed which contains a compound which forms an acid when exposed to high-energy radiation and a compound which is acid-cleavable, and which is characterised in that the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pKa of less than 12 or is a derivative of a compound having such a pKa, which derivative can be converted into the free compound by acid catalysis. The composition claimed, and in particular the recording material prepared therefrom, has a higher sensitivity and an improved resolution, and in addition exhibits no image haze after development.
申请公布号 ZA9001796(B) 申请公布日期 1990.11.28
申请号 ZA19900001796 申请日期 1990.03.08
申请人 HOECHST AKTIENGESELLSCHAFT 发明人 RALPH DAMMEL;GEORG PAWLOSCKI;JUERGEN LINGNAU;JUERGEN THEIS
分类号 G03F7/039;C07C271/28;C07C275/50;C08K5/00;C08L61/00;C08L61/04;G03F7/004;H01L21/027 主分类号 G03F7/039
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