发明名称 |
RADIATION-CURABLE MIXTURE,AND RADIATION-SENSITIVE RECORDING MATERIAL PRODUCED THEREFROM FOR HIGH-ENERGY RADIATION |
摘要 |
A radiation-curable mixture is proposed which contains a compound which forms an acid when exposed to high-energy radiation and a compound which is acid-cleavable, and which is characterised in that the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pKa of less than 12 or is a derivative of a compound having such a pKa, which derivative can be converted into the free compound by acid catalysis. The composition claimed, and in particular the recording material prepared therefrom, has a higher sensitivity and an improved resolution, and in addition exhibits no image haze after development. |
申请公布号 |
ZA9001796(B) |
申请公布日期 |
1990.11.28 |
申请号 |
ZA19900001796 |
申请日期 |
1990.03.08 |
申请人 |
HOECHST AKTIENGESELLSCHAFT |
发明人 |
RALPH DAMMEL;GEORG PAWLOSCKI;JUERGEN LINGNAU;JUERGEN THEIS |
分类号 |
G03F7/039;C07C271/28;C07C275/50;C08K5/00;C08L61/00;C08L61/04;G03F7/004;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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