发明名称 |
Water developable photosensitive resin composition. |
摘要 |
<p>Disclosed is a water developable photosensitive resin composition suitable for a printing plate, which has excellent dimensional stability and excellent chemical and physical properties. The photosensitive resin composition comprises; (A) an acrylic resin of which glass transition temperature (Tg), as defined by <MATH> [wherein Tg1, Tg2, .... represents a glass transition temperature of a homopolymer prepared from each monomer, Tg0 represents a glass transition temperature of a copolymer and W1, W2, .... shows a weight fraction of each monomer.] and acid value (AV) satisfy the following relations; 60 DEG C </= Tg </= 125 DEG C 80 mg KOH/g </= AV </= 130 mg KOH/g, and Tg - 10 </= AV </= Tg + 40 (B) a basic nitrogen atom-containing compound (C) an ethylenically unsaturated monomer, and (D) a photopolymerization initiator. e</p> |
申请公布号 |
EP0399542(A2) |
申请公布日期 |
1990.11.28 |
申请号 |
EP19900109933 |
申请日期 |
1990.05.25 |
申请人 |
NIPPON PAINT CO., LTD.;MITSUBISHI RAYON CO., LTD. |
发明人 |
KAWANAMI, TOSHITAKA;UMEDA, YASUSHI;OSAKA, NORIHISA, C/O PRODUCTS DEVELOPMENT LAB. |
分类号 |
C08L33/04;C08L33/06;C08L33/08;C08L33/10;G03F7/00;G03F7/027 |
主分类号 |
C08L33/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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