| 摘要 |
<p>PURPOSE:To shorten exposure time and improve alignment accuracy requiring no high-power light source by providing a mirror guiding light emitted from a light source of monochromatic light while diverting to a light path for exposure and a light path for alignment. CONSTITUTION:A mirror 41 guiding light A emitted from a light source 19 while diverting to a light path B for exposure and a light path for alignment is provided. Accordingly, when the relative positional relation between a reticle alignment optical system and a wafer-off-axis alignment optical system is to be corrected, the whole of light A emitted from the light source 19 can be guided to the light path C for alignment by switching the mirror 41, and when exposure is actually performance, the mirror 41 is switched to enable the whole of the light A emitted from the light source 19 to be guided to the light path B for exposure. Thereby, exposure time can be shortened while improving alignment accuracy requiring no high-power light source of monochromatic light.</p> |
