发明名称 |
Plasma processing apparatus with a lisitano coil |
摘要 |
A plasma processing apparatus and method is equipped with a vacuum chamber, helmholtz coils, a microwave generator and gas feeding systems. The microwave generator consists of a lisitano coil which is capable of emitting a microwave in the TE011 mode. In the light of such a microwave, a high quality film can be deposited.
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申请公布号 |
US4973883(A) |
申请公布日期 |
1990.11.27 |
申请号 |
US19880188412 |
申请日期 |
1988.04.29 |
申请人 |
SEMICONDUCTOR ENERGY LABORATOR CO., LTD. |
发明人 |
HIROSE, NAOKI;INUGIMA, TAKASHI;TAKAYAMA, TORU |
分类号 |
H01J37/32 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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