| 摘要 |
PURPOSE:To provide the peeling agent which exhibits a high peeling force, does not corrode aluminum and is advantageous in toxicity and waste water treatment by incorporating specific ether and aryl sulfonic acid at prescribed ratios into the agent. CONSTITUTION:The photoresist peeling agent is composed of the ether expressed by formula X-O-Y and the aryl sulfonic acid. In the formula, X, Y are the groups selected from the group consisting of a phenyl group, tolyl group, benzyl group and CnH2n+1 (n=1 to 7). The representative examples of the ether expressed by the formula X-O-Y include dimethyl ether, diethyl ether, etc., among which the more preferable examples are the phenyl ethyl ether, methoxy toluene, ethoxy toluene, and diphenyl ether. The aryl sulfonic acid may be either the aryl sulfonic acid the aryl group of which is substd. or is not substd.; for example, benzene sulfonic acid, toluene sulfonic acid, etc., are preferable. The peeling agent which exhibits the high peeling force, is low in toxicity and has no corrosiveness to aluminum is obtd. in this way. |
