发明名称 A METHOD FOR MANUFACTURING THREE DEMENSIONAL I.C.
摘要 <p>The invention relates to a three-dimensional IC stacked on a base plate comprising a unit semiconductor IC, A, which has each constituent IC (2a, 2b) either on a surface or on both surfaces of a substrate (1). The unit semiconductor IC has a plurality of conducting posts (4), buried in and penetrating through the substrate (1) and insulated therefrom, and also interconnection terminals (6, 7) on both sides of the substrate for connecting another unit semiconductor IC or the base plate. By stacking plural unit ICs on the base plate, a very large-scale IC can be fabricated. each constituent IC is formed on a bulk silicon substrate, so that excellent quality can be obtained. The invention can also be used for the fabrication of ROM structure such as a PROM or MASK ROM, using a single unit semiconductor IC, wherein a wiring for the ROM can be formed on a bottom surface of the substrate.</p>
申请公布号 KR900008647(B1) 申请公布日期 1990.11.26
申请号 KR19870002514 申请日期 1987.03.19
申请人 FUJITSU CO.,LTD. 发明人 KATO DAKASHI;DAKUSHI MASAO
分类号 H01L21/768;H01L23/48;H01L25/065;(IPC1-7):H01L27/00;H01L21/603 主分类号 H01L21/768
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