| 摘要 |
PURPOSE:To enable the general alignment precision in the results transferred by an aligner to be measured easily and accurately by a method wherein the interference lights of reflecting diffraction lights from the first and second auxiliary reflecting diffraction gratings formed on respective sensing substrates are detected in case of transferring the lth layer and the lth+1 layer patterns. CONSTITUTION:In order to take a general positional alignment precision measurement in an exposure device provided with specific alignment optical system, the first auxiliary reflecting diffraction grating 51a is formed on a sensing substrate 30 in case of transferring the lth layer pattern while the second auxiliary reflecting diffraction grating 51b is formed on the position adjacent to the first diffraction grading 51a in case of transferring the lth+1 layer pattern. Later, the said first and second auxiliary reflecting diffraction gratings 51a, 51b are irradiated with the zero transmission diffraction light of the alignment system while the interference light of +m dimensional reflecting diffraction light or -m dimensional reflecting diffraction light from the said first and second diffraction gratings 51a, 51b is detected so that the positional slip of both transferred patterns may be measured by the phase difference made between the signal made out by the detection and a reference signal. |
