发明名称 |
UEBERLAUFTANK FUER HALBLEITER-WAFER-WASCHVORRICHTUNGEN |
摘要 |
<p>An over-flow tank for a semiconductor wafer washing apparatus includes a pair of opposed extensions integrally formed on a pair of opposed side walls of the tank. One of the extensions is provided with pipes and/or other devices. This form of attachment prevents formation of a stepped portion on which dust may accumulate. The extensions also act to guide the flow of clean air over the tanks, so that vapor formed in a chemical liquid tank in one row of such tanks is prevented from entering a pure water tank in an adjacent row.</p> |
申请公布号 |
DE4014938(A1) |
申请公布日期 |
1990.11.22 |
申请号 |
DE19904014938 |
申请日期 |
1990.05.10 |
申请人 |
AIGO, SEIICHIRO, TOKIO/TOKYO, JP |
发明人 |
AIGO, SEIICHIRO, TOKIO/TOKYO, JP |
分类号 |
B08B3/04;H01L21/00;H01L21/304 |
主分类号 |
B08B3/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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