发明名称 |
Diffuser features for spin-coated films |
摘要 |
In forming integrated circuits on a wafer, diffuser features are provided adjacent to topographic features so that when a film is formed by spin-coating a liquid precursor over the integrated circuits, the action of the spreading liquid relative to the diffuser features in proximity to topographic features minimizes radial streaks which would have been caused by the topographic features.
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申请公布号 |
US4971931(A) |
申请公布日期 |
1990.11.20 |
申请号 |
US19900479011 |
申请日期 |
1990.02.12 |
申请人 |
EASTMAN KODAK COMPANY |
发明人 |
WEISS, ARMIN K.;TING, GOODWIN |
分类号 |
G03F7/16;H01L21/027;H01L23/485 |
主分类号 |
G03F7/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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