| 摘要 |
<p>A method of forming an oxide film comprising at least: a first step of forming an oxide film on the surface of a substrate by bringing a solution of oxygen and/or a solution of oxygen-containing molecules into contact with the surface of the substrate on which the oxygen film is to be formed; and a second step of strengthening the bonding of oxygen and the atoms constituting the surface of the substrate in the oxide film by heat-treating the oxide film at a temperature higher than 20°C in a gas phase of oxygen, molecules containing oxygen, or inert gas alone, or a mixture of two or more of them.</p> |
