发明名称 SEMICONDUCTOR WAFER
摘要 <p>PURPOSE:To prevent an effective area of a chip from being reduced by identification marks and to decipher the identification marks after various treatments in a production process have been repeated by a method wherein the identification marks corresponding to items such as a type name, a lot number, a water number and the like of a semiconductor wafer are put on a side face of the semiconductor water. CONSTITUTION:An orientation flat part 2a which has been cut along a chord is formed in one part of a side face 2 of a semiconductor wafer 1. Identification marks 3 corresponding to at least one or more items such as a type name, a lot number, a wafer number and the like are put on the orientation flat part 2a. Thereby, a circuit element and the like are not formed on the side face of the wafer; a process to treat the side face of the wafer is not executed. Accordingly, it is possible to prevent an effective area of a chip from being reduced by the identification marks; it is possible to decipher the identification marks after various treatments in a production process have been repeated.</p>
申请公布号 JPH02278809(A) 申请公布日期 1990.11.15
申请号 JP19890102200 申请日期 1989.04.20
申请人 HITACHI LTD 发明人 KIYOKUNI YOSHIHIKO
分类号 H01L21/02;H01L23/544;H01L29/06 主分类号 H01L21/02
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