| 摘要 |
A method for manufacturing a mask having a phase shift region useful for producing printed circuits comprises the steps of: coating an opaque mask plate (13) and a photosensitive film (15) on a surface of a transparent substrate (11); exposing a predetermined part of the mask plate (13); exposing a predetermined part of the substrate (11) by etching an exposed part of the mask plate (13); forming a pattern region (17) by etching the substrate (11) to a predetermined thickness (d) forming a phase shift region (19) of width (W) by horizontally etching the side of the mask plate (13); and removing the remaining photosensitive film (15). In the method, the thickness difference between the phase shift region (19) and the pattern region (17) can be exactly controlled by the etch to shift the phase of light passing through the pattern region (17) and the phase shift region (19) respectively. The phase shift region (19) is formed as a part of the substrate (11). Accordingly, a long lifetime mask can be easily manufactured. <IMAGE> |
