| 摘要 |
<p>A superconducting element comprising a bridge made of superconducting thin film applied to a substrate, and at least one control electrode made of metallic or semiconducting thin film, an end portion of the control electrode being applied to the bridge so that a part of the bridge at the intersection with the control electrode is remained not to make contact with the control electrode in a direction parpendicular to the axis of the flow of the superconducting current in the bridge, which part being narrow enough to operate as a weak-coupling bridge. A manufacturing method of the superconducting element wherein the superconducting thin film is made of high-Tc oxide superconductor, including a step of applying a resin thin film having resistance to a developing solution of a photoresist to a bridge made of thin film of oxide superconductor or of both a thin film of oxide superconductor and an insulating film, before forming control electrodes. Another manufacturing method of the superconducting element comprising the steps of depositing a thin film of oxide superconductor, depositing a metallic or semiconducting thin film on the thin film of oxide superconductor in the same vacuum chamber without breaking the vacuum and, forming a bridge of the layered structure of the thin films of oxide superconductor and metal or semiconductor by using an ion etching technique with inert gas.</p> |
