发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT USING THE SAME
摘要 PURPOSE:To enhance heat resistance and electric and mechanical characteristics of the composition for forming an interlayer insulating film and a surface protective layer by using a photosensitive adduct obtained by reacting a specified polymer with a specified isocyanate compound. CONSTITUTION:This composition contains the photosensitive adduct obtained by reacting the polymer having the repeating units each represented by formula I with the isocyanate compound having an ethylenically unsaturated group, such as isocyanatoethyl methacrylate, and a photoinitiator, such as 2,4- diethylthioxanthone. In formula I, R1 is a tetravalent aromatic tetracarboxylic acid group, and R2 is a divalent aromatic diamine group, and it is preferred to use a group of formula II for R1, and for R2 a group including formula III in which each of X1 - X4 is H or alkyl. A polymerizable unsaturated compound and an auxiliary photoinitiator can be added to the composition when needed.
申请公布号 JPH02277062(A) 申请公布日期 1990.11.13
申请号 JP19890099168 申请日期 1989.04.19
申请人 HITACHI CHEM CO LTD 发明人 SATO KUNIAKI;KOJIMA YASUNORI;ISHIMARU TOSHIAKI;HAYASHI NOBUYUKI
分类号 G03F7/038;G03F7/075;H01L21/027 主分类号 G03F7/038
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