| 摘要 |
PURPOSE:To hold a mask with high precision without being affected by uneven thickness of a glass substrate by a method wherein shifting members provided on the peripheral parts of a mask holder are sunk in the recessions provided on the positions to align a mask holder with an exposure position on the surface of a mask base. CONSTITUTION:A mask 3 is mounted on a mask holder 10. At this time, the circuit pattern 2 formed surface of the mask 3 turned downward is opposed to a notch window 12 while the peripheral edges of the pattern surface side of the mask 3 are mounted on the mask mounting parts around the notch window 12. Next, the mask holder 10 in such a state is thrusted in the arrow A direction. When respective guide rollers 14 on four corners of the mask holder 10 advance to the recessions 16 formed on a mask base 11, respective guide rollers 14 sink down along the tapered slope and when the rollers 14 further advance to the position exceeding specific depth, the lower surface of the mask holder 10 comes into contact with the upper surface of the mask base 11 to make the holder 10 stop at the point. At this time, the mask holder 10 is to be opposed to the notch window 15. |
