发明名称 Laser patterning apparatus and method
摘要 An improved laser patterning method and apparatus is described. A number of parallel grooves can be formed on a glass substrate coated with an ITO film by projecting flat laser pulses while the substrate is continuously sliding. By this process, the process time for producing a substrate for liquid crystal display can be reduced.
申请公布号 US4970366(A) 申请公布日期 1990.11.13
申请号 US19890328502 申请日期 1989.03.24
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 IMATOU, SHINJI;SHINOHARA, HISATO
分类号 B23K26/00;B23K26/08;B23K26/36;B41M5/24;G03F7/20;H01L21/027 主分类号 B23K26/00
代理机构 代理人
主权项
地址