发明名称 |
Laser patterning apparatus and method |
摘要 |
An improved laser patterning method and apparatus is described. A number of parallel grooves can be formed on a glass substrate coated with an ITO film by projecting flat laser pulses while the substrate is continuously sliding. By this process, the process time for producing a substrate for liquid crystal display can be reduced.
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申请公布号 |
US4970366(A) |
申请公布日期 |
1990.11.13 |
申请号 |
US19890328502 |
申请日期 |
1989.03.24 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
IMATOU, SHINJI;SHINOHARA, HISATO |
分类号 |
B23K26/00;B23K26/08;B23K26/36;B41M5/24;G03F7/20;H01L21/027 |
主分类号 |
B23K26/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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