发明名称 METHOD AND DEVICE FOR MANUFACTURING SEMICONDUCTOR RETICLE
摘要 PURPOSE:To give equal probability and irregularity to variance of a join between patterns due to the movement of a stage by using a random number to determine the quantity of the drawing stage movement of patterns at the time of reticle manufacture. CONSTITUTION:A Y-directional drawing pattern is divided into Y-directional stage movement sections 12 by using a random number sequence to determine random numbers in the Y direction first, and then an X-directional random number sequence is generated according to the number of divisions to determine X-directional stage movement sections 11. A stage moving and electron beam control means 8 controls a drawing means 9 by obtaining division information from a drawing pattern dividing means 7 so that electron beam drawing is performed in areas encircled X and Y arrays and after a stage is moved, pattern drawing is performed, thus drawing a pattern on a reticle. Thus, the quantity of stage movement at the time of the pattern drawing in reticle manufacture is determined by the random number sequences. Consequently, the position of a pattern join by the stage movement appears irregularly with equal probability and the appearance of the position shift of the pattern is generated at random correspondingly.
申请公布号 JPH02275451(A) 申请公布日期 1990.11.09
申请号 JP19890096452 申请日期 1989.04.18
申请人 MATSUSHITA ELECTRON CORP 发明人 SANO YOSHIKAZU;INOUE MORIO
分类号 G03B27/32;G03F1/76;G03F1/78;G03F7/20;H01L21/027 主分类号 G03B27/32
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