| 摘要 |
PURPOSE:To obtain the positive type resist compsn. having an excellent sensitivity, resolving power and heat resistance by adding a polyphenol compd. having a specific structure to the resist compsn. CONSTITUTION:An alkaline soluble resin contg. the polyphenol expressed by formula I and 1, 2-quinone diazide compd. are incorporated into the resist compsn. In the formula I, X denotes formula II or III; alpha is a bivalent group having n-pieces of the repeating units expressed by formula IV or V; n is num ber of >=1; a, b, c, d, e and f denote the number of >=0 and <=3 (d+f) is the number of >=1. R1, R2 and R3 denote the same or different 1 to 18C alkyl group, 1 to 18C alkoxy group, carboxyl group or halogen atom; R4 denotes a hydrogen atom, 1 to 18C alkyl group or 6 to 10C aryl group. The positive type photoresist having the excellent sensitivity, resolving power and heat resistance is obtd. in this way. |
