| 摘要 |
PURPOSE: To improve sensitivity and resolution for short wavelength UV rays, to prevent image fog after developing with a water-based alkali developer and to improve resistance against plasma etching by incorporating a specified compd. which produces an acid by the effect of high energy radiation and a compd. which cleavages with an acid. CONSTITUTION: The mixture contains a compd. which produces acid by the effect of high energy radiation and a compd. which cleavages with acid. The compd. which produces an acid contains a halogen (chlorine or bromine) bonded to aliphatic groups and has pKa<12, or the compd. is a deriv. of a compd. having pKa<12 which cleavages with an acid. The amt. of an initiator compd. in the radiation-sensitive mixture is 0.5 to 50wt.% to the total weight, and preferably 2 to 25wt.%. Thereby, sensitivity and resolution for short wavelength UV rays can be improved, image fog after development with a water-based alkali developer can be prevented, and resistance against plasma etching can be improved. |
