SPUTTERING TARGET USED FOR FORMING QUINARY SUPERCONDUCTIVE OXIDE,申请号EP19890110307-传众专利搜索

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发明名称	SPUTTERING TARGET USED FOR FORMING QUINARY SUPERCONDUCTIVE OXIDE
摘要
申请公布号	EP0377073(A3)	申请公布日期	1990.11.07
申请号	EP19890110307	申请日期	1989.06.07
申请人	MITSUBISHI METAL CORPORATION	发明人	SUGIHARA,TADASHI C/O MITSUBISHI METAL CORP.;OHUCHI,YUKIHIRO C/O MITSUBISHI METAL CORP.;TAKESHITA,TAKUO C/O MITSUBISHI METAL CORP.
分类号	C04B35/45;C22C29/12;C23C14/08;C23C14/34;H01L39/24;(IPC1-7):H01L39/24;C04B35/50	主分类号	C04B35/45
代理机构		代理人
主权项
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