| 摘要 |
<p>PURPOSE:To obtain the high-quality pellicle which is entirely free from defects, such as stains, and >=1mum particles even when visually inspected under a powerful strong light by completely separating an optical thin film body and a substrate by a dry process. CONSTITUTION:The pellicle constituted by extending the optical thin film having the thickness within an about 0.5 to 10mum range on a supporting frame is so formed that the stains do not exist visually sensibly on this thin film body when at least the part of the thin film body thereof to be exposed to exposing rays is irradiated with condensed light of 100W over 0 to 90 deg. angle with the film plane. For example, the pellicle which is subjected to antireflection on both surfaces and has an excellent ray transmittance is produced by applying antireflection layers on both the front and rear surfaces of the optical thin film body. Liquids, such as water, are not used at all in this production process and further, such an excess stage as to provide the source for dust generation as to application of a release agent on a substrate is not adopted. The pellicle which is absent of the sensible stain is obtd. in this way.</p> |
