PROCESS FOR REDUCING THE VARIATION OF A COVER SHEET PATTERN STRUCTURE AS A RESULT OF REFLECTION CREATED BY THE OPTICAL LITHOGRAPHY USED IN THE PRODUCTION OF AN INTEGRATED CIRCUIT,申请号EP19900100749-传众专利搜索

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发明名称	PROCESS FOR REDUCING THE VARIATION OF A COVER SHEET PATTERN STRUCTURE AS A RESULT OF REFLECTION CREATED BY THE OPTICAL LITHOGRAPHY USED IN THE PRODUCTION OF AN INTEGRATED CIRCUIT
摘要
申请公布号	EP0379924(A3)	申请公布日期	1990.11.07
申请号	EP19900100749	申请日期	1990.01.15
申请人	SIEMENS AKTIENGESELLSCHAFT	发明人	NOLSCHER, CHRISTOPH, DR.;MADER, LEONARD, DR.
分类号	G03F7/11;G02B1/11;G03F7/09;H01L21/027;(IPC1-7):G03F7/09	主分类号	G03F7/11
代理机构		代理人
主权项
地址

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