发明名称 Epitaxial layer-bearing wafer of rare earth gallium garnet for MSW device
摘要 An improved epitaxial single crystal wafer suitable as a working element of magnetostatic wave devices is proposed which comprises a substrate single crystal wafer of a rare earth gallium garnet, e.g., gadolinium gallium garnet, neodymium gallium garnet and samarium gallium garnet, and an epitaxial layer formed thereon having a chemical composition, different from conventional yttrium iron garnet, Y3Fe5O12, of the formula (Y1-xMx)aFe8-aO12 or (Y1-xMx)a(Fe1-YQy)8-aO12, in which M is an element selected from the group consisting of bismuth, lanthanum, gadolinium and lutetium, the subscript a is a positive number in the range from 3.0 to 3.1, the subscript x is a positive number in the range from 0.01 to 0.9, Q is an element selected from the group consisting of aluminum, gallium, indium and scandium and the subscript y is a positive number in the range from 0.1 to 0.2. These epitaxial wafers are advantageous in respect of the greatly decreased problem of mismatching in the lattice constants between the substrate and the epitaxial layer.
申请公布号 US4968954(A) 申请公布日期 1990.11.06
申请号 US19890353796 申请日期 1989.05.18
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 RYUO, TOSHIHIKO;FUKUDA, SATORU;MORI, TATSUO;TANNO, MASAYUKI
分类号 H01F10/24;H03B9/14;H03H2/00 主分类号 H01F10/24
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