| 摘要 |
The invention concerns apparatus for the non-destructive measurement of the ohmic resistance of thin layers. The apparatus is based on a capacitative measurement process wherein the plates of a capacitor are formed by an electrode (3) with the thin layer (6) to be measured, the dielectric of the capacitor being constituted by a carrier foil (5) on which the thin layer (6) is carried, for instance by means of a vacuum-depositing process. The electrode (3) is supplied via an oscillator with high-frequency voltage (UHF) so that a displacement current flows from the electrode (3) over the carrier foil (5) to the thin layer (6) and from there back again. This displacement current is composed of an ohmic part and a capacitive part. In order to maintain the capacitative part constant even for fluctuating capacitances, caused e.g. by changes in the thickness of the carrier foil (5), an additional capacitor is connected in a regulated manner to the capacitor that is present.
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