| 摘要 |
PURPOSE:To prevent a patterning accuracy from being worsened by a contamination of a wafer stage on which a wafer is mounted by a method wherein a plurality of wafer stages are prepared, a stage cleaner used to clean the wafer stages is installed and the wafer stages are cleaned whenever an exposure operation is executed. CONSTITUTION:At least two wafer stages 7a, 7b used to hold a wafer 6 are arranged; they can be moved on a rail 10; in addition, a stage cleaner 5 is installed in a route of the circulation rail 10. While an exposure operation is being executed on one wafer stage 7, a remaining wafer stage 7 is cleaned in the wafer cleaner 5. Thereby, it is possible to completely remove fine exfoliated pieces of a photoresist which has adhered to the wafer stage 7. |
