| 摘要 |
PURPOSE:To make data for mask manufacture use coincide completely with the display of data on a CAD and data to be processed following the display by a method wherein all the tops of basic graphic forms constituting a cell, which is used as a component, are set in such a way that the tops are placed on grids designated in the vicinities of the tops in the directions X and Y from the viewpoint of a display and from the viewpoint of data proceeding subsequent to the display. CONSTITUTION:In the design of a mask pattern of a semiconductor integrated circuit device, even if each top of basic graphic forms 1, 3 and 4 constituting a cell, which is used as a component, is constituted of any coordinate values in a CAD device, the cell is arranged on the mask pattern as the component. If so, all the tops of the basic graphic forms 1, 3 and 4 constituting the cell are set in such a way that they are placed on the grids 5 designated nearest the tops among unit grids 5 in the directions X and Y from the viewpoint of a display and from the viewpoint of data processing subsequent to the display. For example, in case the position of each top of a basic graphic form 4 in a cell, which is used as a component, is located as shown by dotted lines 7 in the diagram, the tops of each basic graphic form are corrected in the direction shown by a thick arrow 8 in the diagram from the viewpoint of the display of a CAD of the design of an IC and in respect to data processing following the display and the mask pattern is designed so as to become a mask pattern shown by a full line 6. |
