发明名称 PATTERN FORMING METHOD
摘要 <p>PURPOSE:To simplify the stage of a photolithographic technique by forming films consisting the remaining one group of pattern forming materials on one surface of a substrate formed with (N-1) pieces of pattern groups and sticking adhesive tapes to the surfaces of the films and then stripping the tacky adhesive sheets. CONSTITUTION:Light shielding layers 12 consisting of a polyimide resin of a black color type and the respective picture element pattern groups 14, 16 of red and blue consisting of the polyimide resin system are patterned in this order on one surface of the glass substrate 10 by the ordinary photolithographic technique. A polyimide soln. dissolved with a green dye is spin-coated on one surface of the substrate 10, by which the green films 20 are formed. The films 20 are allowed to air-dry to evaporate the solvent and thereafter, the films 20 are physically stripped by the adhesive tapes, etc., by which only the parts covering the surfaces of the light shielding layers 12 and the red and blue picture element polyimide resins 14, 16 are stripped. The green film materials 20a remain in the parts where the glass surface of the substrate 10 is exposed. The remaining one pattern group is formed in this way by simplifying the stage of the photolithographic technique.</p>
申请公布号 JPH02269302(A) 申请公布日期 1990.11.02
申请号 JP19890091539 申请日期 1989.04.11
申请人 KYODO PRINTING CO LTD 发明人 YAMAMOTO YOSHIHIRO;SHIMAMURA MASAYOSHI
分类号 G02B5/20 主分类号 G02B5/20
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