发明名称 TAPING OF SEMICONDUCTOR WAFER
摘要 <p>PURPOSE:To paste up a wafer on a tape by supplying a wafer on a sticking surface of a sticking tape holding a pattern face upward and scanning a pressurized gas nozzle containing ions on the upper side. CONSTITUTION:A semiconductor wafer 1 is supplied to a paste-up part while holding a pattern face upward by a conveyer 2. A guide roller 3 supplies a tape 4 holding a sticking face upward on a level with the conveyer 2. A nozzle 5 having the longer width than a diameter of the wafer 1 is arranged directly on the roller 3 at the distance of several mm. A static change reducer 6 of an ion source is provided inside the nozzle, while ions generated by discharge upon impressing with high-tension voltage are sprayed on the wafer 1 together with pressurized air introduced into the nozzle 5. The tape 4 is fed at low speed under spray of pressurized air containing ions to press the wafer from one end to the other surface. Since pressurized air contains ions, a circuit element is protected from electrostatic breakdown.</p>
申请公布号 JPH02268453(A) 申请公布日期 1990.11.02
申请号 JP19890090258 申请日期 1989.04.10
申请人 NITTO DENKO CORP 发明人 KANEHARA MATSURO;NODA KAZUHIRO
分类号 H01L21/52;H01L21/301;H01L21/78 主分类号 H01L21/52
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