PROJECTION/EXPOSURE DEVICE AND PROJECTION/EXPOSURE METHOD,申请号WO1990JP00520-传众专利搜索

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发明名称	PROJECTION/EXPOSURE DEVICE AND PROJECTION/EXPOSURE METHOD
摘要	Le dispositif de projection/exposition décrit (1) comporte un système optique à incidence qui projette obliquement de la lumière émise depuis une source lumineuse (1) sur un objet exposé (4), un dispositif de détection (3) qui détecte les franges d'interférence générées par l'interférence de la lumière réfléchie par l'objet exposé (4) avec une lumière de référence, un circuit de traitement qui détermine l'inclinaison et la hauteur de la surface de l'objet exposé (4) à partir des informations optiques des franges d'interférence, et une platine (7) qui supporte l'objet exposé (4), la platine (7) étant actionnée d'après l'inclinaison et la hauteur détectées de l'objet exposé (4), en vue de réaliser la projection/exposition de l'objet exposé (4).
申请公布号	WO9013000(A1)	申请公布日期	1990.11.01
申请号	WO1990JP00520	申请日期	1990.04.20
申请人	HITACHI, LTD.	发明人	OSHIDA, YOSHITADA;TANIMOTO, TETSUZO;TANAKA, MINORU
分类号	G01B9/02;G01B11/00;G01B11/06;G01B11/26;G03F9/00	主分类号	G01B9/02
代理机构		代理人
主权项
地址

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