发明名称 SYSTEM FOR CONTROLLING THE AMOUNT OF SUBSTITUTING LASER GAS.
摘要 <p>A laser gas in a discharge tube (51) is substituted by an exhaust pump (7) maintaining a predetermined substitution quantity for a predetermined period of time immediately after the excitation. In the subsequent period of operation, the laser gas is substituted at a rate smaller than the predtermined rate of substitution. The small rate of substitution may be smaller than one-tenth the predetermined rate of substitution required for a predetermined period of time immediately after the excitation and the laser gas is consumed in small amounts.</p>
申请公布号 EP0394473(A1) 申请公布日期 1990.10.31
申请号 EP19890910923 申请日期 1989.09.29
申请人 FANUC LTD. 发明人 IRIE, MICHIAKI, FANUC DAI 3-BIRA KARAMATSU;IEHISA, NOBUAKI, FANUC MANSION HARIMONI 7-304;YAMAZAKI, ETSUO
分类号 H01S3/097;H01S3/036;H01S3/134 主分类号 H01S3/097
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