发明名称 |
SYSTEM FOR CONTROLLING THE AMOUNT OF SUBSTITUTING LASER GAS. |
摘要 |
<p>A laser gas in a discharge tube (51) is substituted by an exhaust pump (7) maintaining a predetermined substitution quantity for a predetermined period of time immediately after the excitation. In the subsequent period of operation, the laser gas is substituted at a rate smaller than the predtermined rate of substitution. The small rate of substitution may be smaller than one-tenth the predetermined rate of substitution required for a predetermined period of time immediately after the excitation and the laser gas is consumed in small amounts.</p> |
申请公布号 |
EP0394473(A1) |
申请公布日期 |
1990.10.31 |
申请号 |
EP19890910923 |
申请日期 |
1989.09.29 |
申请人 |
FANUC LTD. |
发明人 |
IRIE, MICHIAKI, FANUC DAI 3-BIRA KARAMATSU;IEHISA, NOBUAKI, FANUC MANSION HARIMONI 7-304;YAMAZAKI, ETSUO |
分类号 |
H01S3/097;H01S3/036;H01S3/134 |
主分类号 |
H01S3/097 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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