| 摘要 |
<p>PURPOSE:To discriminate a resist, and to set the conditions of treatment executed to a mask substrate in response to the resist by previously investigating the rate, where radiation having a specific wavelength is absorbed to the resist beforehand, and comparing the value and a value measured by irradiating the resist applied to the mask substrate with radiation. CONSTITUTION:A means 10 for storing the rate, where previously investigated radiation having a specific wavelength is absorbed to a resist, as a set value and a means 7 for measuring the rate where the resist applied to a mask substrate is irradiated with radiation and radiation is absorbed are provided. A means 9 for comparing correspondence to either of set values stored of the measured value and discriminating the resist and a means 1 for masking the conditions of the treatment of the mask substrate correspond to the kind of the resist of the basis of the result of discrimination and setting the conditions are furnished. Accordingly, proper treatment conditions corresponding to the resist on the basis of the result of discrimination can be set without through the resist discriminating operation of an operator.</p> |
