发明名称 |
Mask, mask producing method and pattern forming method using mask. |
摘要 |
<p>A mask includes a transparent layer (2) which is transparent with respect to a light which is used for an exposure, and a mask pattern layer (5) which is formed on the transparent layer. At least a portion of the mask pattern layer (5) is made up solely of a phase shift layer (3a) for transmitting the light, so that a phase shift occurs between a phase of the light transmitted through the phase shift layer and a phase of the light transmitted through a portion of the mask having no phase shift layer.</p> |
申请公布号 |
EP0395425(A2) |
申请公布日期 |
1990.10.31 |
申请号 |
EP19900304571 |
申请日期 |
1990.04.26 |
申请人 |
FUJITSU LIMITED |
发明人 |
KAWABATA, TOSHIAKI;NAKAGAWA, KENJI;YAMAGUCHI, SEIICHIRO;TAGUCHI, MASAO;SUMI, KAZUHIKO;YANAGISHITA, YUICHIRO |
分类号 |
G03F1/00;G03F1/34;G03F1/68;G03F1/80;H01L21/027;H01L21/30 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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