发明名称 Mask, mask producing method and pattern forming method using mask.
摘要 <p>A mask includes a transparent layer (2) which is transparent with respect to a light which is used for an exposure, and a mask pattern layer (5) which is formed on the transparent layer. At least a portion of the mask pattern layer (5) is made up solely of a phase shift layer (3a) for transmitting the light, so that a phase shift occurs between a phase of the light transmitted through the phase shift layer and a phase of the light transmitted through a portion of the mask having no phase shift layer.</p>
申请公布号 EP0395425(A2) 申请公布日期 1990.10.31
申请号 EP19900304571 申请日期 1990.04.26
申请人 FUJITSU LIMITED 发明人 KAWABATA, TOSHIAKI;NAKAGAWA, KENJI;YAMAGUCHI, SEIICHIRO;TAGUCHI, MASAO;SUMI, KAZUHIKO;YANAGISHITA, YUICHIRO
分类号 G03F1/00;G03F1/34;G03F1/68;G03F1/80;H01L21/027;H01L21/30 主分类号 G03F1/00
代理机构 代理人
主权项
地址