发明名称 |
Method of forming pattern by using an electroconductive composition. |
摘要 |
<p>A pattern-forming method using an electroconductive composition comprising at least one TCNQ complex salt selected from the group consisting of isoquinolinium-TCNQ complex salts, quinolinium-TCNQ complex salts, alkyl pyridinium-TCNQ complex salts, and morpholinium-TCNQ complex salts, a specific polymer, and a solvent are disclosed. This composition gives an electroconductive film having a superior long-term storage stability and electroconductive characteristics. When this electroconductive composition is coated on a resist to form an electroconductive film, and a pattern is formed by an irradiation with charging beams, such as electron beams, an accumulation of charges (charge-up) is prevented and a fine resist pattern in which a misregistration is completely prevented is obtained.</p> |
申请公布号 |
EP0395426(A2) |
申请公布日期 |
1990.10.31 |
申请号 |
EP19900304591 |
申请日期 |
1990.04.27 |
申请人 |
FUJITSU LIMITED;NITTO CHEMICAL INDUSTRY CO., LTD. |
发明人 |
WATANABE, KEIJI, FUJITSU ATSUGI-RYO, 3-10;YONEDA, YASUHIRO;KOBAYASHI, KOICHI;YANO, KEIKO;NAKAMURA, TOMIO;SHIMIZU, SHIGERU |
分类号 |
G03F7/004;G03F7/027;G03F7/20;G03F7/26;H01L21/027;H01L21/66 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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