发明名称 Field effect transistors and method of making a field effect transistor.
摘要 <p>A high electron mobility transistor a or metal semiconductor field effect transistor comprising an n&lt;+&gt; type InGaAs layer (26) formed on the upper surface of the device, source and drain electrodes (33, 34) deposited on the n&lt;+&gt; type InGaAs layer (26), said electrodes (33, 34) being made of a metal forming non-alloyed ohmic-contacts with said InGaAs layer (26), a gate electrode (32) also made of said metal, said gate electrode being self-aligned with the source and drain electrodes (33, 34) and separated from said source and drain electrodes (33, 34) by means of L-shaped insulating films.</p>
申请公布号 EP0394590(A2) 申请公布日期 1990.10.31
申请号 EP19890312165 申请日期 1989.11.23
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 SHIMURA, TERUYUKI C/O MITSUBISHI DENKI K.K.
分类号 H01L21/285;H01L21/335;H01L21/338;H01L29/417;H01L29/423;H01L29/45;H01L29/47;H01L29/778;H01L29/812 主分类号 H01L21/285
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