| 摘要 |
<p>A process for forming diamond coatings is disclosed, in which a gas or a mixture of gases is passed through a low temperature silent discharge to generate a low temperature non-equilibrium plasma gas stream, the plasma gas stream is adiabatically expanded into a region of lover pressure to ford a plasma gas stream of highly ionized and dissociated gases, a carbon-containing gas is injected into the plasma gas stream during or after the expansion into a region of lower pressure, and the plasma gas stream is then directed onto the surface of a substrate to form the diamond coating.</p> |
