发明名称 Heterojunction field effect transistor
摘要 A heterojunction field effect transistor includes a carrier supplying layer comprising material which is not likely to produce a deep level even by doping. A channel layer comprises material which has the largest electron affinity among three types of semiconductor material constituting the heterojunction FET and has a high carrier mobility. A spacer layer is interposed between the channel layer and the carrier supplying layer and comprises material which enables the reduction of Coulomb interaction between two-dimensional carriers in the channel layer and ions in the carrier supplying layer. In addition, the spacer layer increases the effective conduction band energy discontinuity DELTA Ec between the carrier supplying layer and the channel layer.
申请公布号 US4967242(A) 申请公布日期 1990.10.30
申请号 US19890300262 申请日期 1989.01.19
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 SONODA, TAKUJI;HAYASHI, KAZUO
分类号 H01L29/205;H01L21/338;H01L29/778;H01L29/812 主分类号 H01L29/205
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