| 摘要 |
PURPOSE:To enhance sensitivity and resolution of a resist by incorporating a specified compound in a specified polymer. CONSTITUTION:This resist is formed by adding quaternary ammonium perchlorate (B) of formula II, each of R1 - R4 being 1 - 20 C alkyl, such as tetra-n-butyl ammonium perchlorate, to a cyclohexyl 2-cyanoacrylate polymer (A) of formula I having a molecular weight of 10<5> - 10<6>. This resist can be developed by a solvent mixture of 2-ethoxyethanol and 2-propanol and the like in a short time without leaving any residual film. |
