Fluoropolymer thin film coatings and method of preparation by plasma polymerization.

摘要

The subject invention relates to a process for the deposition of an oxygen-containing high fluoropolymer thin film onto an approxpriate substrate comprising loading the substrate in an enclosed reactor; evacuating the reactor; charging the reactor with an inert carrier gas and an oxygen-containing fluorocarbon monomer feed gas; and plasma-polymerizing the feed gas such that a thin film of polymerized monomer is deposited onto the substrate. The invention further relates to an insulation material comprising the fluoropolymer thin film recited above, a plasma polymerized thin film of an oxygen-containing fluoropolymer, and the use of a polymerization precursor monomer for such thin films that is an oxygen-containing fluorocarbon monomer.