发明名称 |
Power field effect devices having small cell size and low contact resistance and method of fabrication. |
摘要 |
<p>A multi-cellular power field effect semiconductor device includes a high conductivity layer of metal or a metal silicide (158) disposed in intimate contact with the source region (120) of the device. This high conducrivity layer is self-aligned with respect to the aperture in the gate electrode (131) through which the source region is diffused. The presence of this high conductivity layer allows a substantially smaller contact window to be employed for making contact between the final metalization (134) and the source region. As a consequence, the aperture in the gate electrode and the cell size of the device can both be substantially reduced. The device has substantially improved operating characteristics. A method of producing the device is also described.</p> |
申请公布号 |
EP0393949(A1) |
申请公布日期 |
1990.10.24 |
申请号 |
EP19900304018 |
申请日期 |
1990.04.12 |
申请人 |
GENERAL ELECTRIC COMPANY |
发明人 |
KORMAN, CHARLES STEVEN;BALIGA, BANTVAL JAYANT;SHENAI, KRISHNA;PIACENTE, PATRICIA ANN;GOROWITZ, BERNARD;KIM, MANJIN JEROME;CHOW, TAT-SING PAUL |
分类号 |
H01L29/45;H01L21/285;H01L21/336;H01L29/417;H01L29/745;H01L29/78 |
主分类号 |
H01L29/45 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|