发明名称 Power field effect devices having small cell size and low contact resistance and method of fabrication.
摘要 <p>A multi-cellular power field effect semiconductor device includes a high conductivity layer of metal or a metal silicide (158) disposed in intimate contact with the source region (120) of the device. This high conducrivity layer is self-aligned with respect to the aperture in the gate electrode (131) through which the source region is diffused. The presence of this high conductivity layer allows a substantially smaller contact window to be employed for making contact between the final metalization (134) and the source region. As a consequence, the aperture in the gate electrode and the cell size of the device can both be substantially reduced. The device has substantially improved operating characteristics. A method of producing the device is also described.</p>
申请公布号 EP0393949(A1) 申请公布日期 1990.10.24
申请号 EP19900304018 申请日期 1990.04.12
申请人 GENERAL ELECTRIC COMPANY 发明人 KORMAN, CHARLES STEVEN;BALIGA, BANTVAL JAYANT;SHENAI, KRISHNA;PIACENTE, PATRICIA ANN;GOROWITZ, BERNARD;KIM, MANJIN JEROME;CHOW, TAT-SING PAUL
分类号 H01L29/45;H01L21/285;H01L21/336;H01L29/417;H01L29/745;H01L29/78 主分类号 H01L29/45
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