发明名称
摘要 1. A method of producing nucleate boiling sites on a surface of a silicon semiconductor body for cooling said body by means of a halogenated hydrocarbon cooling fluid, wherein by means of sandblasting the surface of a silicon substrate lattice defects and crystalline damage are made in said surface, characterized in that the lattice defects and crystalline damages are removed by selectively exposing this surface to a silicon etchant.
申请公布号 JPS5811101(B2) 申请公布日期 1983.03.01
申请号 JP19780123692 申请日期 1978.10.09
申请人 INTAANASHONARU BIJINESU MASHIINZU CORP 发明人 RUDORUFU GURUUENSUPAN FURIISAA;MOOTON DEI RIIBAA
分类号 H01L23/44;H01L21/304;H01L21/306;H01L21/322;H01L23/427;H05K7/20 主分类号 H01L23/44
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